Chapter

Simulation of images and electron diffraction patterns

Xiaodong Zou, Sven Hovmöller and Peter Oleynikov

in Electron Crystallography

Published in print August 2011 | ISBN: 9780199580200
Published online January 2012 | e-ISBN: 9780191731211 | DOI: http://dx.doi.org/10.1093/acprof:oso/9780199580200.003.0012

Series: International Union of Crystallography Texts on Crystallography

Simulation of images and electron diffraction patterns

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The principles behind simulation of images and electron diffraction patterns are described. The parameters that affect HRTEM images and ED patterns are crystal structure, orientation and thickness, as well as the electron optics. The multislice and Bloch-wave methods are described and compared.

Keywords: image simulation; ED simulation; Bloch wave; multislice calculation; electron optical parameters; focus series; crystal orientation; zone axis; crystal thickness

Chapter.  3114 words.  Illustrated.

Subjects: Crystallography

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