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A technique used in the manufacture of semiconductor components, integrated circuits, etc. It depends on the principle of masking selected areas of a surface and exposing the unmasked areas to such processes as the introduction of impurities, deposition of thin films, removal of material by etching, etc. The technique has been developed for use on tiny structures (typically measured in micrometres), which can only be examined by means of an electron microscope.

Subjects: Bibliography — Physics.

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